Crowborough War Memorial Hospital

Calculations are reported on the rotation-vibration energy levels of the arsine molecule with associated transition intensities. A potential energy surface (PES) obtained from ab initio electronic structure calculations is refined to experimental data, and the resulting energy levels display sub-wavenumber accuracy for all reliably known J = 0 term values under 6500 cm-1. After a small empirical adjustment of the band centres, our calculated (J = 1-6) rovibrational states reproduce 578 experimentally derived energies with a root-mean-square error of 0.122 cm-1. Absolute line intensities are computed using the refined PES and a new dipole moment surface (DMS) for transitions between states with energies up to 10 500 cm-1 and rotational quantum number J = 30. The computed DMS reproduces experimental line intensities to within 10% uncertainty for the ν1 and ν3 bands. Furthermore, our calculated absorption cross-sections display good agreement with the main absorption features recorded in the Pacific Northwest National Laboratory (PNNL) for the complete range of 600-6500 cm-1.

Journal Article Richard II in 1381 and 1399 Get access G. O. SAYLES G. O. SAYLES CrowboroughSussex Search for other works by this author on: Oxford Academic Google Scholar The English Historical Review, Volume XCIV, Issue CCCLXXIII, October 1979, Pages 820–829, https://doi.org/10.1093/ehr/XCIV.CCCLXXIII.820 Published: 01 October 1979

Summary The identification of internal defects in trees has, until recently, depended upon such external evidence as fruiting bodies of fungal decay organisms, cavities, weeping wounds and reduced canopy densities. Drills and probes, for example increment borers, frequently created wounds which formed foci of infection for wood decay organisms. The process of visual tree assessment using the Fractometer makes it possible to measure the strength of a tree trunk suspected of internal decay. The Sibert Decay Detecting Drill (DDD200) with a 1.5 mm probe defines and delineates decay and sound wood as well as providing a print-out showing the state of the wood. This information which may also be of assistance in any legal proceedings can be used to determine the exact extent of defects and weaknesses.

Summary A total of 676 trees in the Borough of Tunbridge Wells, Kent, England, most of which are protected by tree preservation orders, were valued at £811,200 using the system devised by HELLIWELL (1990a), or £1,200 per tree. By applying this figure to the whole of the Borough, the value of an estimated 15,000 trees to the community is calculated at £18 million. The implications of this assessment on the cost of care and maintenance of these trees in the Borough are discussed. Résumé La valeur de 676 arbres protégés par des ordonnances de préservation (TPO) dans la municipalité de Tunbridge Wells, dans le Kent (Angleterre) a été calculée à £811.200 selon le système inventé par HELLIWELL (1990a), soit £1200 par arbre. Si l'on applique ce chiffre à la municipalité entière, la valeur pour la communauté des 15,000 arbres qui, estime-t-on, y poussent, atteint £18 millions. On considère les conséquences de cette évaluation en ce qui concerne les frais des soins et de l'entretien des arbres dans la municipalité. Sumario Se han valorado un total de 676 árboles protegidos por las Ordenanzas de preservación de árboles (TPOs) en el municipio de Tunbridge Wells, en Kent, Inglaterra, a 811.200 libras esterlinas usando el sistema ideado por HELLIWELL (1990) ó a 1.200 libras por árbol. Aplicando esta cifra a todo el municipio, el valor de los 15.000 árboles estimados en la comunidad se eleva a 18 milliones de libras. Se estudian las implicaciones de esta valoración sobre el coste del cuidado y mantenimiento de los árboles en al municipio.

Aims Autistic burnout, a profound psychological state characterised by increased stress, exhaustion, and a decline in functional abilities, has begun to be documented in adults but remains under-recognised in children. This abstract aims to shed light on autistic burnout in children, particularly in the context of school avoidance, and calls for a comprehensive approach to recognition, understanding, and intervention in this area. Methods A retrospective audit was conducted on the case notes of 20 children, all diagnosed with autism, who had been unable to attend school for at least three months. The audit involved compiling a checklist of symptoms commonly associated with autistic burnout. This checklist included: chronic exhaustion, loss of skills previously acquired, diminished interest in activities, heightened sensory sensitivities, social withdrawal, mood dysregulation, and physical complaints. The primary objective was to investigate the presence of symptoms typically associated with autistic burnout in these children. To achieve this, information regarding these symptoms was extracted from their case notes. Results Age: 8 to 17 years, 10 boys, 10 girls. 90% of the children had an EHCP (Education Health Care Plan). 100% of the children experienced chronic exhaustion, loss of skills & interests, increase in sensory needs, social withdrawal, mood dysregulation and physical symptoms. Conclusion The alarming trend of school refusal among autistic children is a phenomenon that merits close scrutiny, not only for its impact on the child's education but also for the broader implications including the significant burden on families. The uniformity in the reported symptoms across the group strongly indicates a shared underlying issue. In the context of autism, these symptoms align with what is known about autistic burnout. These symptoms can significantly impact the quality of life and daily functioning, including the ability to attend school. Understanding of these symptoms as part of autistic burnout could lead to better support strategies, accommodations, and potentially improved outcomes for autistic children who are refusing school. It necessitates a shift from a potentially punitive approach to one that is compassionate and accommodative, ensuring that strategies are in place to support autistic children's return to school when they are ready and able to do so. These findings highlight an urgent need for research into autistic burnout in children, recognition of this concept by health and education and a need to re-evaluate current educational practices and support systems for autistic children in school.

X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are just two techniques which rely on the detection of electrons for the analysis of surfaces. There are several more. To those can be added techniques that rely upon the detection of photons and ions. People should also consider those techniques for which the input radiation is the photon, electron, and ion. This chapter tabulates a list of the most popular of those techniques. Each of the techniques mentioned in the table has its own set of strengths and weaknesses and it is often necessary to use more than one technique to achieve a full analysis. For this reason, many surface analysis instruments can be used for two or more types of analysis. The chapter also summarizes the properties of some of the more popular techniques.

It is possible to use both X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) to provide compositional information as a function of depth, although they are essentially methods of surface analysis. The choice of method depends largely upon the required depth of analysis or the thickness of the layers being analysed. Although the non-destructive methods are extremely useful for assessing compositional changes in the near surface region of the material, to obtain data from depths greater than this it is necessary to remove material by ion bombardment within the spectrometer. To analyse to greater depths than is practical using sputtering, it is necessary to resort to a process which removes material before beginning the analysis. Material removal can be achieved using a finely focused gallium ion beam, or by using two mechanical methods such as angle lapping and ball cratering.

Abstract The death in 1677 of Gilbert Sheldon, Archbishop of Canterbury, was followed by a dispute concerning the fate of his books. Sheldon had bequeathed a generous portion, listed in a schedule to be annexed to his will, to Lambeth Palace Library. However his executors alleged that the schedule could not be found. The entire collection was thereupon removed from Lambeth and its dispersal by sale was set in motion. The collection was saved, in large part, by the elevation to the see of Canterbury of one of the most bibliophile Archbishops in its history, William Sancroft. Beginning in 1679 Sancroft pursued the Sheldon legacy through two courts before finally reaching a settlement favourable to Lambeth Palace Library in 1683.

The earliest known official use of the term ‘parliament’ Get access H. G. RICHARDSON, H. G. RICHARDSON Goudhurst Search for other works by this author on: Oxford Academic Google Scholar G. O. SAYLES G. O. SAYLES Crowborough Search for other works by this author on: Oxford Academic Google Scholar The English Historical Review, Volume LXXXII, Issue CCCXXV, October 1967, Pages 747–750, https://doi.org/10.1093/ehr/LXXXII.CCCXXV.747 Published: 01 October 1967

This chapter first reviews the physical principles of X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) processes along with their strengths and weaknesses, and then considers the uses and applications of the two methods. XPS provides sensitive elemental analysis of a surface, but its great advantage is that it can provide a chemical state analysis as well. The use of a finely focused electron beam for AES enables people to achieve surface analysis at a high spatial resolution, in a manner analogous to electron probe microanalysis in the scanning electron microscope. Because of the complementary nature of the two methods and the ease with which Auger and photoelectron analyses can be made on the same instrument, the two methods have come to be regarded as the most important methods of surface analysis in the context of materials science. All manufacturers of electron spectrometers offer both XPS and AES options for their systems.

atomic layer deposition ARXPS angle-resolved XPS (or angle-dependent XPS) CAE constant analyser energy CHA concentric hemispherical analysers CMA cylindrical mirror analyser CRR constant retard ratio DLD delay-line detector EBSD electron backscatter diffraction EELS electron energy loss spectroscopy ESCA electron spectroscopy for chemical analysis EDX (EDS) energy dispersive X-ray spectroscopy (or spectrometer) EPMA electron probe micro analysis FAT fixed analyser transmission FIB focused ion beam FRR fixed retard ratio FWHM full width at half maximum GO graphene oxide HAXPES (or HAXPS) hard X-ray photoelectron spectroscopy Glossary Many of the terms and definitions are taken from ISO 18115 and are reproduced with the permission of the International Organization for Standardization, ISO.This standard can be obtained from any ISO member and from the website of the ISO Central Secretariat at the following address: http://www.iso.ch/ -now available FOC from NPL, NIST, etc. HPLC High-performance liquid chromatography.HSA hemispherical sector analyser IMFP inelastic mean free path ISS ion scattering spectroscopy LEISS low-energy ion scattering spectroscopy LMIG liquid metal ion gun MALDI matrix-assisted laser desorption/ionisation mass spectrometry MCP microchannel plate NAPXPS near ambient pressure XPS NPA normalised peak area OFET organic field-effect transistor OLED organic light-emitting diode PA peak area PET polyethylene terephthalate PSD position-sensitive detector ptp peak-to-peak QUASES quantitative analysis of surfaces by electron spectroscopy RAD resistive-anode detector RBS Rutherford backscattering spectrometry RDP relative depth plot REELS reflection electron energy-loss spectroscopy RHEED reflection high-energy electron diffraction SAM scanning Auger microscope (or microscopy) SAM self-assembled monolayer SAXPS (SAX) small area XPS SEM scanning electron microscope SIMS secondary ion mass spectrometry SMA spherical mirror analyser SNMS sputtered neutral mass spectrometry SSA spherical sector analyser TOF (ToF) time of flight UHV ultra-high vacuum UPS ultra-violet photoelectron spectroscopy VPSEM variable pressure SEM WDX (WDS) wavelength-dispersive X-ray spectroscopy (or spectrometer) X-AES X-ray induced Auger electron spectroscopy XPS X-ray photoelectron spectroscopy XRD X-ray diffraction 10.

CHA) 41 cylindrical mirror (CMA) 37, 40, 81 energy 2, 19, 21, 26, 30 c

The output from an electron spectrometer is amenable to many levels of interpretation. It ranges from a simple qualitative assessment of the elements present to a full-blown quantitative analysis complete with assignments of chemical states, and determination of the phase distribution for each element. In practice, a happy medium is usually required with an estimation made of the relative amounts of each element present. There are certain similarities in the way that Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) spectra are treated. The chapter considers them together as this also provides a means of comparing the analytical capabilities of the two methods. As both XPS and AES are mature analytical techniques with almost five decades of use in a variety of fundamental and applied scientific investigations, it is to be expected that quantification of the electron spectra produced in the two techniques has reached a high level of precision.

The prime purpose for purchasing an electron spectrometer is to analyse materials using either X-ray photoelectron spectroscopy (XPS) or Auger electron spectroscopy (AES). However, many such instruments allow other valuable analytical measurements to be performed. Some of these measurements require the purchase of additional hardware but others make use of the hardware that is usually present on a basic instrument. Low energy ion scattering spectroscopy is extremely surface specific, only detecting atoms in the top one or two atomic layers of the sample. Many electron spectrometers have an electron source which, when used in combination with the energy analyser, is suitable for making some types of reflection electron energy loss spectroscopy measurement. There are two types of energy loss process, elastic scattering, and inelastic scattering, each of which can be used to complement analysis using XPS or ultraviolet photoelectron spectroscopy.

In this chapter, the authors consider the way in which it is possible to make use of the surface analysis techniques to provide information which furthers our knowledge in a particular discipline. Although X-ray photoelectron spectroscopy and Auger electron spectroscopy together with scanning Auger microscopy are used widely in all branches of pure and applied sciences – as well as for trouble shooting and quality assurance purposes – the only area that the authors will consider in the chapter, is their use in materials science investigations. If they subdivide this group, it is possible to identify the following applications headings; metallurgy (including surface engineering), corrosion, ceramics, microelectronic and semiconductor materials, polymers, adhesion, nanotechnology, biology, and energy. The authors also consider each of these areas in turn, representative references for each are listed in the bibliography which will provide interested readers with further examples and guidance in their field of interest.

The prelims comprise: Half-Title Page Title Page Copyright Page Table of Contents Preface to First Edition Preface to Second Edition Acknowledgements

If your project needs to operate a wireless communications system, you need to attach antennas to it. There are two important factors to consider. Firstly, the ARTIK boards need the mini-coaxial connectors to be coupled to approved antennas for broadcasting a wireless signal. Secondly, the SMA connectors on the developer board must have the correct kind of antennas installed. This chapter covers the relevant information regarding antennas.

Great care must be taken when preparing, transporting and mounting samples for surface chemical analysis. Surfaces are easily contaminated or damaged, by scratching, for example. Such damage can mask or even remove the intended analyte. Analysts should also be aware of the history of the sample so that the likelihood of damage or contamination can be assessed; it should be remembered that prior analysis can change the nature of the sample surface. Customers requiring X-ray photoelectron spectroscopy (XPS) or Auger electron spectroscopy (AES) analysis from consultancy laboratories should provide control of substances hazardous to health regulations documentation with their samples. XPS relies upon the emission of electrons from the surface of the sample. If this sample is an insulator, then the surface will develop a positive charge. It is therefore essential that sample charging is carefully controlled. A comprehensive guide to sample handling may be found in the International Standard ISO 20579-1.

The design and construction of electron spectrometers is a complex undertaking and will usually be left to one of the handful of specialist manufacturers worldwide, although many users specify minor modifications to suit their own requirements. The various modules necessary for analysis by electron spectroscopy are (in addition to a sample): a source of the primary beam (either X-rays or electrons), an electron energy analyser and detection system, all contained within a vacuum chamber, and a data system, which is an integral part of the instrument. Most commercial spectrometers are based on vacuum systems designed to operate in the ultra-high vacuum in a particular pressure range, and most X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) experiments are carried out in this pressure range. There are two types of electron energy analyser in general use for XPS and AES: the cylindrical mirror analyser and the hemispherical sector analyser.