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Reverse engineering source polarization error

Published in Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE • Oct 21, 2005
Authors:
George E. Bailey
,
Kostas Adam
,
Travis Brist

Abstract

With the advent of the first immersion and hyper-NA exposure tools, source polarization quality will become a hot topic. At these oblique incident angles, unintentional source polarization could result in the intensity loss of diffraction orders possibly inducing resolution or process window loss. M...

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