AN EFFICIENT DIFFUSION ALGORITHM FOR 2‐D VLSI PROCESS MODELING CODE
Published in COMPEL The International Journal for Computation and Mathematics in Electrical and Electronic Engineering • Apr 1, 1990
NobleIDNI4P99W77R73S24
Authors:,
E. Stefanov
Asen Asenov
Abstract
The coupled set of non‐linear 2D diffusion equations for donor and acceptor type impurities with initial and appropriated boundary conditions is solved by an implicit locally‐one dimensional finite difference method. Numerical experiments have been made to achieve a reasonable trade‐off between the ...
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