Pattern width evaluation method for electron-beam pattern data
Published in Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena • Nov 1, 1995
NobleIDNI4P59W61R95S03
Authors:,,
Toshifumi Watanabe
Shigeru Moriya
Kazuhiko Komatsu
Abstract
A new pattern width evaluation method for electron-beam (e-beam) writing has been developed. The method can predict the overall pattern width accuracy objectively and quantitatively by taking into account the exposure intensity distribution function and specific e-beam writing data in which the dose...
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