Bias optimization through simulation for contact array pattern
Published in Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE • Dec 15, 2003
NobleIDNI3P75W51R91S86
Authors:,
Thomas V. Pistor
Ksenia Berger
Abstract
A binary mask with a 2D contact array pattern was simulated for the purpose of determining optimum amounts of bias for various pitches. The objective was to center the elliptical process windows for a given set of pitches about a nominal dose. The nominal dose was set by the center of the process wi...
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