Multi-parameter model based advanced process control
Published in 2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (IEEE Cat. No.04CH37530) • Sep 7, 2004
NobleIDNI3P73W68R27S49
Authors:
С. А. Величко
Abstract
Advanced Process Control (APC) plays an important role in the modern semiconductor fab. Using non-linear multiple input multiple output (MIMO) control models we significantly improve positive process outcomes. However, non-linear models also impose greater computing requirements, creating computing ...
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