Pattern-Integrated Interference Lithography Demonstration
Published • Jan 1, 2012
NobleIDNI0P14W48R10S31
Authors:,,
Guy M. Burrow
Matthieu C. R. Leibovici
Thomas K. Gaylord
Abstract
Pattern-integrated interference lithography (PIIL), a new method integrating superposed pattern imaging with interference lithography, is presented. A prototype implementation is used to demonstrate PIIL potential through the single-exposure fabrication of representative photonic crystal structures.
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