Self-aligned double pattern process using DSA pattern
Published • Feb 19, 2021
Authors:,,
Makoto Muramatsu
Takanori Nishi
Yasuyuki Ido
Abstract
Directed self-assembly (DSA) is one of the candidates for next generation lithography. Over the past years, many papers and presentation have been reported regarding DSA, and Tokyo Electron Limited (TEL is a registered trademark or a trademark of Tokyo Electron Limited in Japan and /or other countri...
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