Etching
Published • Sep 22, 2015
NobleIDNI6P20W08R22S91
Authors:
S. J. Pearton
Abstract
Wet and dry etching of semiconductors used in optoelectronics is reviewed. In cases where the active region width is large (>3 µm), wet etching provides a simple, effective method for pattern transfer. For more demanding structures and for a greater degree of control during device fabrication, plasm...
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