Significant magnetoresistance enhancement due to a cotunneling process in a double tunnel junction with single discontinuous ferromagnetic layer insertion.

H, Sukegawa; S, Nakamura; A, Hirohata; N, Tezuka; K, Inomata

doi:10.1103/physrevlett.94.068304

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Significant magnetoresistance enhancement due to a cotunneling process in a double tunnel junction with single discontinuous ferromagnetic layer insertion.

Shared by NobleBlocks on Feb 17, 2005 • 12:00 AM UTC

Authors:

Sukegawa H

Nakamura S

Hirohata A

Abstract

We fabricate CoFe/AlOx/CoFe/AlOx/CoFe ferromagnetic double tunnel junctions and observe spin-dependent tunneling phenomena. A middle CoFe layer becomes discontinuous by forming CoFe particles two dimensionally, of which the average diameter is evaluated to be 2.0-4.5 nm from cross-sectional transmis...

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