PECVD-AlOx/SiNx Passivation Stacks on Silicon: Effective Charge Dynamics and Interface Defect State Spectroscopy

Amaru Töfflinger, Jan; Laades, A.; Leendertz, Caspar; Montañez, Liz; Korte, Lars; Stürzebecher, Uta; Sperlich, H.; Rech, B.

doi:10.1016/j.egypro.2014.08.068

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PECVD-AlOx/SiNx Passivation Stacks on Silicon: Effective Charge Dynamics and Interface Defect State Spectroscopy

Shared by NobleBlocks on Jan 1, 2014 • 12:00 AM UTC

Authors:

Jan Amaru Töfflinger

A. Laades

Caspar Leendertz

Abstract

The charge dynamics and the interface defect state density of AlOx/SiNx passivation stacks deposited by plasma-enhanced chemical vapor deposition (PECVD) on crystalline silicon (c-Si) wafers are investigated. High frequency (1 MHz) capacitance voltage (C-V) measurements were performed on stacks in t...

Subject

Passivation

Materials science

Plasma-enhanced chemical vapor deposition

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