Особенности механизма диффузии в структуре алюминий-кремний при облучении ее поверхности внеэлектродной плазмой высоковольтного газового разряда
Published in Журнал технической физики • Dec 20, 2019
NobleIDNI3P59W99R06S31
Authors:,
В.А. Колпаков
С. В. Кричевский
Abstract
Features of the diffusion mechanism in Al-Si structure when its surface is irradiated by off-electrode plasma of high-voltage gas discharge at discharge current I=50 mA, accelerating voltage U=4 kV and radiation durations 90 s < t ≤ 600 s are investigated. Model for calculating the concentration pro...
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