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Влияние металлических масок на согласование нижнего электрода с высокочастотным генератором смещения при реактивно-ионном травлении массивных подложек

Published in Письма в журнал технической физики • Jan 1, 2021
NobleIDNI1P53W13R88S33
Authors:
С.Д. Полетаев
,
А.И. Любимов

Abstract

The effect of metal masks on the matching of the lower electrode with a high-frequency bias generator during selective reactive-ion etching through the mask of massive substrates in freon-14 has been studied theoretically and experimentally. It is shown that masks with a substrate coating above 30% ...

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