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等圧下におけるシリコン中の点欠陥の輸送現象

Published in Kyushu University Institutional Repository (QIR) (Kyushu University) • Dec 24, 1999
NobleIDNI8P271W713R771S508
Authors:
浩一 柿本
,
Koichi Kakimoto
,
コウイチ カキモト

Abstract

Molecular dynamics simulation of vacancy and self-interstitial atoms in silicon crystals was carried out to investigate diffusion mechanism and coefficients of vacancy and self-interstitial atoms. Pressure dependence of diffusion coefficients of the point defects is not significant, although tempera...

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